Automated image measurement for process development and optimization

ABSTRACT

A method includes providing attributes of a manufacturing process and an image of a product associated with the manufacturing process to a trained machine learning model. The method further includes obtaining, from the trained machine learning model, predictive data. The method further includes determining, based on the predictive data, image measurements of the image of the product associated with the manufacturing process. Manufacturing parameters of the manufacturing process are to be updated based on the image measurements.

RELATED APPLICATIONS

This application is a continuation application of U.S. patentapplication Ser. No. 16/259,891, filed Jan. 28, 2019, the entirecontents of which are hereby incorporated by reference herein.

TECHNICAL FIELD

The present disclosure relates to image measurement, and, moreparticularly, automated image measurement, such as for semiconductorprocessing.

BACKGROUND

Large amounts of images (e.g., of wafers, etc.) are generated bydifferent industries (e.g., semiconductor industry, biomedical industry,display industry, photovoltaic industry, etc.). For example, thousandsof images may be generated every month in a semiconductor laboratoryduring process development. To perform image measurements, a setup(e.g., recipe setup) may be created for measuring attributes (e.g.,product width, height, etc.) of a first image. The setup may be run onthe remaining images to measure attributes of the remaining images. Ifthe remaining images have variations (e.g., variation in structure ofthe product, variations due to change in process and imaging conditions,etc.), the setup created based on the first image may not apply and asystem using the setup may fail to measure the attributes of theremaining images. Due to this failure, the remaining images may bemanually measured by process engineers. The manual measurements mayinclude errors, may be subject to variations from one engineer toanother engineer, and may take up much engineer time.

SUMMARY

The following is a simplified summary of the disclosure in order toprovide a basic understanding of some aspects of the disclosure. Thissummary is not an extensive overview of the disclosure. It is intendedto neither identify key or critical elements of the disclosure, nordelineate any scope of the particular implementations of the disclosureor any scope of the claims. Its sole purpose is to present some conceptsof the disclosure in a simplified form as a prelude to the more detaileddescription that is presented later.

In an aspect of the disclosure, a method includes receiving an image ofa product associated with a manufacturing process and determining, usinga trained machine learning model, an image classification for the image.The method further includes selecting, based on the imageclassification, one or more image processing algorithms for the imageand pre-processing the image based on at least one of the one or moreimage processing algorithms to generate an enhanced image. The methodfurther includes measuring, using a first image processing algorithm ofthe one or more image processing algorithms, one or more attributes ofthe enhanced image to determine image measurements and reporting theimage measurements. The manufacturing parameters of the manufacturingprocess are to be updated based on the image measurements.

In another aspect of the disclosure, a system includes a memory and aprocessing device coupled to the memory. The processing device is toreceive an image of a product associated with a manufacturing processand determine, using a trained machine learning model, an imageclassification for the image. The processing device is further toselect, based on the image classification, one or more image processingalgorithms for the image and pre-process the image based on at least oneof the one or more image processing algorithms to generate an enhancedimage. The processing device is further to measure, using a first imageprocessing algorithm of the one or more image processing algorithms, oneor more attributes of the enhanced image to determine image measurementsand report the image measurements. The manufacturing parameters of themanufacturing process are to be updated based on the image measurements.

In another aspect of the disclosure, a non-transitory computer readablemedium having instructions stored thereon, which, when executed by aprocessing device, cause the processing device to receive an image of aproduct associated with a manufacturing process and determine, using atrained machine learning model, an image classification for the image.The processing device is further to select, based on the imageclassification, one or more image processing algorithms for the imageand pre-process the image based on at least one of the one or more imageprocessing algorithms to generate an enhanced image. The processingdevice is further to measure, using a first image processing algorithmof the one or more image processing algorithms, one or more attributesof the enhanced image to determine image measurements and report theimage measurements. The manufacturing parameters of the manufacturingprocess are to be updated based on the image measurements.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is illustrated by way of example, and not by wayof limitation in the figures of the accompanying drawings.

FIG. 1 is a block diagram illustrating an exemplary system architecture,according to certain embodiments.

FIG. 2 is an example data set generator to create data sets for amachine learning model, according to certain embodiments.

FIG. 3 is a block diagram illustrating a system for determining imageclassification, according to certain embodiments.

FIG. 4 is a block diagram illustrating a system for determining imageclassification, according to certain embodiments.

FIG. 5 is a flow diagram illustrating an example method of determiningimage measurements, according to certain embodiments.

FIG. 6 is a flow diagram illustrating an example method of generatingdata sets for determining image classification, according to certainembodiments.

FIG. 7 is a block diagram illustrating a system for generating syntheticimages, according to certain embodiments.

FIG. 8 is a flow diagram illustrating an example method of generatingsynthetic images, according to certain embodiments.

FIG. 9 is a block diagram illustrating a computer system, according tocertain embodiments.

DETAILED DESCRIPTION

Described herein are technologies directed to automated imagemeasurement for faster process development and optimization (e.g., forfaster semiconductor process development and optimization). Inconventional systems, a user may create a setup (e.g., recipe setup) formeasuring attributes (e.g., width, height, etc.) of a product based on afirst image and run the setup on remaining images to measure attributesof the remaining images. If the remaining images have variations, thesetup created on the first image may not apply and a system using thesetup may fail to measure the attributes of the remaining images.Conventional systems may not be able to handle variations in structuresin images responsive to changes in manufacturing processes and imagingconditions. For example, images may have one or more variations (e.g.,due to different process or imaging conditions, etc.) including one ormore of different contrasts, gradients, dark areas, colors, intensities,attributes with different dimensions (e.g., width, height, elongation),etc. A system that is to measure an attribute of an image by determininga distance from a first edge to a second edge may not be able toidentify the first edge and second edge because of these variations. Thesystem may either provide an erroneous measurement (e.g., distancebetween different portions of the image than the first edge and thesecond edge) or may fail to provide a measurement. Images withvariations may be manually measured by process engineers. The manualmeasurements may include errors, may be subject to variations from oneengineer to another engineer, and may take up much engineer time.

The devices, systems, and methods disclosed herein use automated imagemeasurement for faster process development and optimization. Aprocessing device may receive an image (of original images captured byan imaging system) of a product associated with a manufacturing processand determine, using a trained machine learning model, an imageclassification for the image. The processing device may select, based onthe image classification, one or more image processing algorithms andprocess information for the image. The processing device may pre-processthe image based on at least one of the one or more image processingalgorithms and/or the process information to generate an enhanced image(e.g., the image may be enhanced to better identify the edges forperforming measurements). The processing device may measure, using afirst image processing algorithm (e.g., image measurement algorithm) ofthe one or more image processing algorithms, one or more attributes ofthe enhanced image to determine image measurements and may report theimage measurements. The manufacturing parameters of the manufacturingprocess may be updated based on the image measurements.

In some embodiments, the processing device may determine that theoriginal images are insufficient to train the machine learning model.The processing device may perform, based on process information aboutthe manufacturing process, feature extraction to identify features of afirst original image that are expected to change based on manufacturingparameters of the manufacturing process. The processing device maygenerate a first synthetic image (of synthetic images) by performingtargeted deformation of one or more of the features of the firstoriginal image. The targeted deformation may adjust one or more features(e.g., generate synthetic images by deforming features in originalfeatures that are expected to change based on the manufacturingparameters). The original images and the synthetic images in combinationmay be sufficient to train the machine learning model. The processingdevice may use the original images and the synthetic images to train amachine learning model to automatically determine an image processingalgorithm to use for measuring one or more attributes of images ofproduct associated with the manufacturing process.

The devices, systems, and methods disclosed herein may be able to handlelarge variation in structures (e.g., using a priori information ofprocess structure and image processing algorithms to handle variations)for semiconductor process flow optimization (e.g., due to changes inprocessing or imaging conditions) and may be applicable to multipleimage modalities (e.g., scanning electron microscope (SEM),cross-sectional SEM (XSEM), transmission electron microscope (TEM),top-down imaging, cross-section imaging, etc.) in research anddevelopment laboratories, production facilities, biomedicalapplications, etc. The devices, systems, and methods disclosed hereinmay automatically measure different types of structures or imagescaptured by different types of modality, without any user intervention,by identifying the type of structure present in the image automatically(e.g., image classification) and applying image processing (e.g., togenerate measurement statistics and optimize manufacturing processes,such as in semiconductor research and development laboratories). Thedevices, systems, and methods disclosed herein may not rely on usercreation of a setup (e.g., recipe setup) before starting measurement onsimilar looking images. The automated process of image measurement, asdisclosed herein, may avoid manual measurement error, avoidengineer-engineer variation, and free up engineer time. The devices,systems, and methods disclosed herein may not rely on user assistancefor setup.

Aspects of the present disclosure result in technological advantages ofsignificant reduction in energy consumption (e.g., battery consumption),bandwidth, processor overhead, and so forth. In some embodiments, thetechnological advantages result from using automated image measurementto determine image measurements of images with variations (e.g.,variations due to change in process and imaging conditions, etc.) whichreduces errors, variations from engineer to engineer, and user timecompared to manual image measurement. The reduced error andengineer-to-engineer variations may result in less used bandwidth, lowerprocessor overhead, and lower energy consumption (e.g., that would haveotherwise been used to correct the errors, etc.). The automated imagemeasurement of the present disclosure may result in faster processdevelopment and optimization (e.g., for semiconductor manufacturingprocesses). For example, manufacturing parameters of manufacturingprocesses may be updated based on the automated image measurements(e.g., of images with and without variations). The updated manufacturingparameters may be determined via the automated image measurements of thepresent disclosure which results in using less energy, less bandwidth,less processor overhead, less errors, less engineer-to-engineervariations, etc. than performing manual measurements. The updates to themanufacturing parameters determined via the present disclosure canproduce products faster and that are optimized (e.g., more likely withinspecification) than conventional approaches. In some embodiments, thetechnological advantages further result from synthetically generatingimages for training a machine learning model to automatically determinean image processing algorithm to use for automated image measurement(e.g., instead of not having enough images to train the machine learningmodel and resulting to performing manual measurements).

FIG. 1 is a block diagram illustrating an exemplary system architecture100, according to certain embodiments. The system architecture 100includes client device 120, manufacturing equipment 124, imagingequipment 126, an image measurement server 130, and a data store 140.The image measurement server 130 may be part of an image measurementsystem 110. Image measurement system 110 may further include servermachines 170 and 180.

The imaging equipment 126 may include one or more of a scanning electronmicroscope (SEM), a cross-sectional SEM (XSEM), a transmission electronmicroscope (TEM), a top-down imaging device, a cross-section imagingdevice, etc. The imaging equipment 126 may provide images (e.g.,historical images 142, images 148, etc.) of products (e.g., wafers,semiconductor devices, coatings, etched regions, implanted regions,etc.) associated with a manufacturing process (e.g., products processedby manufacturing equipment 124). The images may be stored in the datastore 140. The images may be associated (e.g., labeled) with one or moreof manufacturing process attributes 144 (e.g., job attributes,manufacturing tool or equipment, project, customer, program, type ofmanufacturing process), image classifications 146, manufacturingparameters 156, etc.

The client device 120, manufacturing equipment 124, imaging equipment126, image measurement server 130, data store 140, server machine 170,and server machine 180 may be coupled to each other via a network 160 todetermine image measurements 154 for determining updates tomanufacturing parameters 156 of manufacturing processes. In someembodiments, network 160 is a public network that provides client device120 with access to the image measurement server 130, data store 140, andother publically available computing devices. In some embodiments,network 160 is a private network that provides client device 120 withaccess to the image measurement server 130, data store 140, and otherprivately available computing devices. Network 160 may include one ormore wide area networks (WANs), local area networks (LANs), wirednetworks (e.g., Ethernet network), wireless networks (e.g., an 802.11network or a Wi-Fi network), cellular networks (e.g., a Long TermEvolution (LTE) network), routers, hubs, switches, server computers,cloud computing networks, and/or a combination thereof.

The client device 120 may include a computing device such as personalcomputers (PCs), laptops, mobile phones, smart phones, tablet computers,netbook computers, network connected televisions (“smart TV”),network-connected media players (e.g., Blu-ray player), a set-top-box,over-the-top (OTT) streaming devices, operator boxes, etc. The clientdevice 120 may be capable of receiving images (e.g., historical images142, images 148) from imaging equipment 126, receiving imagemeasurements 154 or updates to manufacturing parameters 156 from theimage measurement system 110, etc. via the network 160. The clientdevice 120 may determine manufacturing process attributes 144, imageclassifications 146, manufacturing parameters 156, etc. associated withimages (e.g., by receiving data from one or more of the manufacturingequipment 124, imaging equipment, or data store 140). The client device120 may be capable of transmitting images (e.g., historical images 142,images 148), manufacturing process attributes 144, image classifications146, manufacturing parameters 156, etc. to the image measurement system110, receiving updates to manufacturing parameters 156 from the imagemeasurement system 110, transmitting the updates to the manufacturingparameters 156 to the manufacturing equipment 124, etc. via the network160. In some embodiments, client device 120 may modify manufacturingparameters (e.g., process parameters, hardware parameters, etc.) of themanufacturing equipment 124 based on the image measurements 154 orupdates to the manufacturing parameters 156. Each client device 120 mayinclude an operating system that allows users to one or more ofgenerate, view, or edit data (e.g., image measurements 154,manufacturing parameters 156, etc.).

The client device 120 may include a manufacturing parameter modificationcomponent 122. Manufacturing parameter modification component 122 mayreceive user input (e.g., via a graphical user interface displayed viathe client device 120) associated with images for automated imagemeasurement. For example, the user input may indicate one or more ofimages, manufacturing process attributes 144, image classifications 146,manufacturing parameters 156, a manufacturing process, manufacturingequipment 124, etc. In some embodiments, the client device 120 transmitsthe user input (e.g., images, manufacturing process attributes 144,etc.) to the image measurement server 130 and the client device 120receives image measurements 154 from the image measurement server 130.The client device 120 may determine updates to the manufacturingparameters 156 of a manufacturing process and may cause themanufacturing parameters 156 of the manufacturing equipment 124 to beupdated accordingly (e.g., transmit the updates to the manufacturingparameters 156 to the manufacturing equipment 124, implement the updatesto the manufacturing parameters 156, etc.). In some embodiments, theimage measurement server 130 determines the updates to the manufacturingparameters 156. In some embodiments, the image measurement server 130 orthe client device 120 determine updates to the imaging parameters of theimaging equipment 126 and cause imaging parameters of the imagingequipment 126 to be updated (e.g., transmit the updates to the imagingparameters to the imaging equipment 126, implement the updates to theimaging parameters, etc.).

The image measurement server 130 may include one or more computingdevices such as a rackmount server, a router computer, a servercomputer, a personal computer, a mainframe computer, a laptop computer,a tablet computer, a desktop computer, graphics processing unit (GPU),accelerator application-specific integrated circuit (ASIC) (e.g., tensorprocessing unit (TPU)), etc. The image measurement server 130 mayinclude an image measurement component 132. In some embodiments, theimage measurement component 132 may use images 148 and manufacturingprocess attributes 144 to determine image measurements 154. The resultsof the image measurements 154 may be used for updating manufacturingparameters 156 of a manufacturing process being developed). In someembodiments, the image measurement server 130 may use a trained machinelearning model 190 to determine an image classification 146 foridentifying a corresponding image processing algorithm 149 andcorresponding process information 150 to generate an enhanced image 152to be processed for determining image measurements 154.

The image measurement component 132 may receive (e.g., retrieve from thedata store 140) an image 148 of a product (e.g., wafer) associated witha manufacturing process and manufacturing process attributes 144associated with the manufacturing process. The image measurementcomponent 132 may determine, using a trained machine learning model 190,an image classification 146 for the image (e.g. based on the image 148and the manufacturing process attributes 144). The image measurementcomponent 132 may select, based on the image classification 146, animage processing algorithm 149 and process information 150 for the image148. The image measurement component 132 may pre-process the image 148based on at least one of the image processing algorithm 149 or theprocess information 150 to generate an enhanced image 152. The imagemeasurement component 132 may measure, using the image processingalgorithm 149, one or more attributes (e.g., width of portions of theproduct, height of portions of the product, etc.) of the enhanced image152 to determine image measurements 154 and may report the imagemeasurements 154 (e.g., to the client device 120). The manufacturingparameters 156 of the manufacturing process (e.g., of the manufacturingequipment 124 on which the manufacturing process was performed) may beupdated based on the image measurements 154.

Data store 140 may be a memory (e.g., random access memory), a drive(e.g., a hard drive, a flash drive), a database system, or another typeof component or device capable of storing data. Data store 140 mayinclude multiple storage components (e.g., multiple drives or multipledatabases) that may span multiple computing devices (e.g., multipleserver computers). The data store 140 may store one or more ofhistorical images 142, manufacturing process attributes 144, imageclassifications 146, images 148, image processing algorithms, processinformation 150, enhanced images 152, image measurements 154,manufacturing parameters 156, etc. The historical images 142 may includeoriginal images 142A over a period of time or for a plurality of runs ofthe manufacturing equipment 124. The historical images 142 may includesynthetic images 142B created based on the original images 142A. Eachhistorical image 142 may correspond to a respective instance ofmanufacturing process attributes 144 (e.g., the instance ofmanufacturing parameters 156 used by the manufacturing equipment 124 toproduce products corresponding to the historical image 142), imageclassification 146, etc.

In some embodiments, manufacturing parameters 156 include one or more ofsettings (e.g., process parameters) or components (e.g., size, type,hardware parameters, etc.) of the manufacturing equipment 124.Manufacturing parameters 156 may include one or more of temperature(e.g., heater temperature), spacing (SP), pressure, high frequency radiofrequency (HFRF), voltage of electrostatic chuck (ESC), current, a firstprecursor, a first dilutant, a second dilutant, a first reactant, asecond reactant, a second precursor, gas flow rate for one or moregases, etc.

In some embodiments, the client device 120 may store one or more ofhistorical images 142 (e.g., images used or to be used for training of amachine learning model), manufacturing process attributes 144, imageclassifications 146, or images 148 (e.g., images input or to be inputinto a trained machine learning model to determine image classifications146) in the data store 140 and the image measurement server 130 mayretrieve one or more of historical images 142, manufacturing processattributes 144, image classifications 146, or images 148 from the datastore 140. In some embodiments, the image measurement server 130 maystore one or more of image measurements 154 or manufacturing parameters156 in the data store 140 and the client device 120 may retrieve one ormore of image measurements 154 or manufacturing parameters 156 from thedata store 140.

In some embodiments, image measurement system 110 further includesserver machine 170 and server machine 180. The server machines 170 and180 may be one or more computing devices (such as a rackmount server, arouter computer, a server computer, a personal computer, a mainframecomputer, a laptop computer, a tablet computer, a desktop computer,etc.), GPUs, ASICs (e.g., TPUs), data stores (e.g., hard disks, memoriesdatabases), networks, software components, or hardware components.

Server machine 170 includes a data set generator 172 that is capable ofgenerating data sets (e.g., a set of data inputs and a set of targetoutputs) to train, validate, or test a machine learning model 190. Someoperations of data set generator 172 are described in detail below withrespect to FIGS. 2 and 6. In some embodiments, the data set generator172 may partition the historical images 142 (e.g., and correspondingmanufacturing process attributes 144) and image classifications 146 intoa training set (e.g., sixty percent of the historical images 142), avalidating set (e.g., twenty percent of the historical images 142), anda testing set (e.g., twenty percent of the historical images 142).

Server machine 180 includes a training engine 182. Server machine 180may also include a validation engine 184, a selection engine, and atesting engine 186. An engine (e.g., a training engine 182, a validationengine 184, a selection engine, and a testing engine 186) may refer tohardware (e.g., circuitry, dedicated logic, programmable logic,microcode, processing device, etc.), software (such as instructions runon a processing device, a general purpose computer system, or adedicated machine), firmware, microcode, or a combination thereof. Thetraining engine 182 may be capable of training a machine learning model190 using the training set from data set generator 172. The trainingengine 182 may generate multiple trained machine learning models 190,where each trained machine learning model 190 corresponds to a distinctset of features (e.g., images 142 and a first portion of themanufacturing process attributes 144, images 142 and a second portion ofthe manufacturing process attributes 144, etc.) of the training set. Forexample, a first trained machine learning model may have been trainedusing all features (e.g., features X1-X5 and all manufacturing processattributes 144), a second trained machine learning model may have beentrained using a first subset of the features (e.g., X1, X2, X4, and afirst portion of manufacturing process attributes 144), and a thirdtrained machine learning model may have been trained using a secondsubset of the features (e.g., X1, X3, X4, and X5, and a second portionof the manufacturing process attributes 144) that may partially overlapthe first subset of features.

The validation engine 184 may be capable of validating a trained machinelearning model 190 using a corresponding set of features of thevalidation set from data set generator 172. For example, a first trainedmachine learning model 190 that was trained using a first set offeatures of the training set may be validated using the first set offeatures of the validation set. The validation engine 184 may determinean accuracy of each of the trained machine learning models 190 based onthe corresponding sets of features of the validation set. The validationengine 184 may discard trained machine learning models 190 that have anaccuracy that does not meet a threshold accuracy. In some embodiments,the selection engine 185 may be capable of selecting one or more trainedmachine learning models 190 that have an accuracy that meets a thresholdaccuracy. In some embodiments, the selection engine 185 may be capableof selecting the trained machine learning model 190 that has the highestaccuracy of the trained machine learning models 190.

The testing engine 186 may be capable of testing a trained machinelearning model 190 using a corresponding set of features of a testingset from data set generator 172. For example, a first trained machinelearning model 190 that was trained using a first set of features of thetraining set may be tested using the first set of features of thetesting set. The testing engine 186 may determine a trained machinelearning model 190 that has the highest accuracy of all of the trainedmachine learning models based on the testing sets.

The machine learning model 190 may refer to the model artifact that iscreated by the training engine 182 using a training set that includesdata inputs and corresponding target outputs (correct answers forrespective training inputs). The data inputs may include images and/orprocessing parameters. The data outputs may include manufacturinginformation, an identification of image enhancement processes to performon images and/or an identification of an image measurement algorithm toperform on the images. Patterns in the data sets can be found that mapthe data input to the target output (the correct answer), and themachine learning model 190 is provided mappings that captures thesepatterns. The machine learning model 190 may be a convolutional neuralnetwork (CNN). The CNN may be able to receive images as training,validation, or testing input. The trained CNN may be able to receiveimages as input (e.g., for determining image classification).

Image measurement component 132 may provide an image 148 andcorresponding manufacturing process attributes 144 as input to thetrained machine learning model 190 and may run the trained machinelearning model 190 on the input to obtain one or more outputs. Imagemeasurement component 132 may be capable of extracting an imageclassification 146 from the output of the trained machine learning model190 and may extract confidence data from the output that indicates alevel of confidence that the image 148 corresponds to the imageclassification 146. The image measurement component 132 may use theconfidence data to decide whether to use the image classification 146 toidentify a corresponding image processing algorithm 149 and processinformation 150 for generating an enhanced image 152 and determiningimage measurements 154.

The confidence data may include or indicate a level of confidence of animage classification 146 corresponding to the image 148. In one example,the level of confidence is a real number between 0 and 1 inclusive,where 0 indicates no confidence of an image classification 146corresponding to the image 148 and 1 indicates absolute confidence of animage classification 146 corresponding to the image 148.

For purpose of illustration, rather than limitation, aspects of thedisclosure describe the training of a machine learning model usinghistorical images 142, manufacturing process attributes 144, and imageclassifications 146 and inputting images 148 into the trained machinelearning model to determine image classifications 146. The imageclassifications may be associated with process information, imageprocessing algorithms, image enhancement processes, and/or imagemeasurement algorithms. Once an image classification 146 is determined,the associated process information, at least one of the image processingalgorithms, and/or image enhancement processes may be used to enhancethe image, and the associated image measurement algorithm (e.g., of theimage processing algorithms) and/or process information may be used toautomatically perform a measurement on the enhanced image. A result ofthe image measurement may be used for updating of manufacturingparameters 156. In other implementations, a heuristic model orrule-based model is used to determine image classifications 146 forupdating of manufacturing parameters 156 (e.g., without using a trainedmachine learning model). Image measurement component 132 may monitorhistorical images 142. Any of the information described with respect todata inputs 210 of FIG. 2 may be monitored or otherwise used in theheuristic or rule-based model.

In some embodiments, the functions of client device 120, imagemeasurement server 130, server machine 170, and server machine 180 maybe provided by a fewer number of machines. For example, in someembodiments server machines 170 and 180 may be integrated into a singlemachine, while in some other embodiments, server machine 170, servermachine 180, and image measurement server 130 may be integrated into asingle machine.

In general, functions described in one embodiment as being performed byclient device 120, image measurement server 130, server machine 170, andserver machine 180 can also be performed by image measurement server 130in other embodiments, if appropriate. In addition, the functionalityattributed to a particular component can be performed by different ormultiple components operating together. For example, in someembodiments, the image measurement server 130 may transmit the updatesto manufacturing parameters 156 to the manufacturing equipment 124. Inanother example, client device 120 may determine the imageclassifications 146 based on output from the trained machine learningmodel 190.

In addition, the functions of a particular component can be performed bydifferent or multiple components operating together. One or more of theimage measurement server 130, server machine 170, or server machine 180may be accessed as a service provided to other systems or devicesthrough appropriate application programming interfaces (API).

In embodiments, a “user” may be represented as a single individual.However, other embodiments of the disclosure encompass a “user” being anentity controlled by a plurality of users and/or an automated source.For example, a set of individual users federated as a group ofadministrators may be considered a “user.”

Although embodiments of the disclosure are discussed in terms ofdetermining image measurements to update manufacturing parameters 156 ofmanufacturing equipment 124 in manufacturing facilities (e.g.,semiconductor manufacturing facilities, biomedical facilities),embodiments may also be generally applied to determining measurements(e.g., of attributes with variations). Embodiments may be generallyapplied to optimizing process development.

FIG. 2 is an example data set generator 272 (e.g., data set generator172 of FIG. 1) to create data sets for a machine learning model (e.g.,model 190 of FIG. 1) using historical images 242 (e.g., historicalimages 142 of FIG. 1), according to certain embodiments. System 200 ofFIG. 2 shows data set generator 272, data inputs 210, and target output220.

In some embodiments, data set generator 272 generates a data set (e.g.,training set, validating set, testing set) that includes one or moredata inputs 210 (e.g., training input, validating input, testing input)and one or more target outputs 220 that correspond to the data inputs210. The data set may also include mapping data that maps the datainputs 210 to the target outputs 220. Data inputs 210 may also bereferred to as “features,” “attributes,” or “information.” In someembodiments, data set generator 272 may provide the data set to thetraining engine 182, validating engine 184, or testing engine 186, wherethe data set is used to train, validate, or test the machine learningmodel 190. Some embodiments of generating a training set may further bedescribed with respect to FIG. 6.

In some embodiments, data inputs 210 may include one or more ofhistorical images 242 (e.g., historical images 142 of FIG. 1),manufacturing process attributes 244 (e.g., manufacturing processattributes 144 of FIG. 1), etc. Each instance of manufacturing processattributes 244 may include one or more process parameters, hardwareparameters, etc. Target output 220 may include image classifications 246(e.g., image classifications 146 of FIG. 1). The image classificationsmay include or be associated with process information, one or more imageprocessing algorithms, image enhancement processes and/or imagemeasurement algorithms.

In some embodiments, data set generator 272 may generate a first datainput corresponding to a first set of features (e.g., one or more firstmanufacturing process attributes 244) to train, validate, or test afirst machine learning model and the data set generator 272 may generatea second data input corresponding to a second set of features (e.g., oneor more second manufacturing process attributes 244) to train, validate,or test a second machine learning model.

In some embodiments, the data set generator 272 may discretize one ormore of the data input 210 or the target output 220 (e.g., to use inclassification algorithms for regression problems). Discretization ofthe data input 210 or target output 220 may transform continuous valuesof variables into discrete values. In some embodiments, the discretevalues for the data input 210 indicate discrete manufacturing processattributes 244.

Data inputs 210 and target outputs 220 to train, validate, or test amachine learning model may include information for a particular facility(e.g., for a particular semiconductor manufacturing facility). Forexample, the historical images 242, manufacturing process attributes244, and image classifications 246 may be for the same manufacturingfacility as the images 148.

In some embodiments, the information used to train the machine learningmodel may be from specific types of manufacturing equipment 124 of themanufacturing facility having specific characteristics. The trainedmachine learning model may determine outcomes for a specific group ofmanufacturing equipment 124 based on data input 210 associated with oneor more components sharing characteristics of the specific group. Insome embodiments, the information used to train the machine learningmodel may be for components from two or more manufacturing facilitiesand may allow the trained machine learning model to determine outcomesfor components based on input from one manufacturing facility.

In some embodiments, subsequent to generating a data set and training,validating, or testing machine learning model 190 using the data set,the machine learning model 190 may be further trained, validated, tested(e.g., using manually determined image classifications, etc.), oradjusted (e.g., adjusting weights associated with input data of themachine learning model 190, such as connection weights in a neuralnetwork).

FIG. 3 is a block diagram illustrating a system 300 for determiningimage classifications 346 (e.g., image classifications 146 of FIG. 1),according to certain embodiments.

At block 310, the system 300 (e.g., image measurement system 110 ofFIG. 1) performs data partitioning (e.g., via data set generator 172 ofserver machine 170 of FIG. 1) of the historical images 342 (e.g.,historical images 142 of FIG. 1) to generate the training set 302,validation set 304, and testing set 306. For example, the training setmay be 60% of the historical images 342, the validation set may be 20%of the historical images 342, and the validation set may be 20% of thehistorical images 342. The system 300 may generate a plurality of setsof features for each of the training set, the validation set, and thetesting set. For example, if the manufacturing process attributes 344has 20 manufacturing process attributes (e.g., process parameters,hardware parameters, etc.) and 100 runs for each manufacturing processattribute, a first set of features may be manufacturing processattributes 1-10, a second set of features may be manufacturing processattributes 11-20, the training set may be runs 1-60, the validation setmay be runs 61-80, and the testing set may be runs 81-100. In thisexample, the first set of features of the training set would bemanufacturing process attributes 1-10 of runs 1-60.

At block 312, the system 300 performs model training (e.g., via trainingengine 182 of FIG. 1) using the training set 302. The system 300 maytrain multiple models using multiple sets of features of the trainingset 302 (e.g., a first set of features of the training set 302, a secondset of features of the training set 302, etc.). For example, system 300may train a machine learning model to generate a first trained machinelearning model using the first set of features in the training set(e.g., manufacturing process attributes 1-10 of runs 1-60) and togenerate a second trained machine learning model using the second set offeatures in the training set (e.g., manufacturing process attributes11-20 of runs 1-60). In some embodiments, the first trained machinelearning model and the second trained machine learning model may becombined to generate a third trained machine learning model (e.g., whichmay be a better predictor than the first or the second trained machinelearning model on its own). In some embodiments, sets of features usedin comparing models may overlap (e.g., first set of features beingmanufacturing process attributes 1-15 and second set of features beingmanufacturing process attributes 5-20). In some embodiments, hundreds ofmodels may be generated including models with various permutations offeatures and combinations of models.

At block 314, the system 300 performs model validation (e.g., viavalidation engine 184 of FIG. 1) using the validation set 304. Thesystem 300 may validate each of the trained models using a correspondingset of features of the validation set 304. For example, system 300 mayvalidate the first trained machine learning model using the first set offeatures in the validation set (e.g., manufacturing process attributes1-10 of runs 61-80) and the second trained machine learning model usingthe second set of features in the validation set (e.g., manufacturingprocess attributes 11-20 of runs 61-80). In some embodiments, the system300 may validate hundreds of models (e.g., models with variouspermutations of features, combinations of models, etc.) generated atblock 312. At block 314, the system 300 may determine an accuracy ofeach of the one or more trained models (e.g., via model validation) andmay determine whether one or more of the trained models has an accuracythat meets a threshold accuracy. Responsive to determining that none ofthe trained models has an accuracy that meets a threshold accuracy, flowreturns to block 312 where the system 300 performs model training usingdifferent sets of features of the training set. Responsive todetermining that one or more of the trained models has an accuracy thatmeets a threshold accuracy, flow continues to block 316. The system 300may discard the trained machine learning models that have an accuracythat is below the threshold accuracy (e.g., based on the validationset).

At block 316, the system 300 performs model selection (e.g., viaselection engine 315) to determine which of the one or more trainedmodels that meet the threshold accuracy has the highest accuracy (e.g.,the selected model 308, based on the validating of block 314).Responsive to determining that two or more of the trained models thatmeet the threshold accuracy have the same accuracy, flow may return toblock 312 where the system 300 performs model training using furtherrefined training sets corresponding to further refined sets of featuresfor determining a trained model that has the highest accuracy.

At block 318, the system 300 performs model testing (e.g., via testingengine 186 of FIG. 1) using the testing set 306 to test the selectedmodel 308. The system 300 may test, using the first set of features inthe testing set (e.g., manufacturing process attributes 1-10 of runs81-100), the first trained machine learning model to determine the firsttrained machine learning model meets a threshold accuracy (e.g., basedon the first set of features of the testing set 306). Responsive toaccuracy of the selected model 308 not meeting the threshold accuracy(e.g., the selected model 308 is overly fit to the training set 302and/or validation set 304 and not applicable to other data sets such asthe testing set 306), flow continues to block 312 where the system 300performs model training (e.g., retraining) using different training setscorresponding to different sets of features (e.g., differentmanufacturing process attributes). Responsive to determining that theselected model 308 has an accuracy that meets a threshold accuracy basedon the testing set 306, flow continues to block 320. In at least block312, the model may learn patterns in the historical images 342 to makepredictions and in block 318, the system 300 may apply the model on theremaining data (e.g., testing set 306) to test the predictions.

At block 320, system 300 uses the trained model (e.g., selected model308) to receive images 348 and corresponding manufacturing processattributes 344 (e.g., images 148 and corresponding manufacturing processattributes 144 of FIG. 1) and extracts, from the output of the trainedmodel, a corresponding image classification 346 (e.g., imageclassification 346 of FIG. 1).

In some embodiments, responsive to manually determining imageclassification of an image, flow may continue to block 312 (e.g., via afeedback loop) where the manually determined image classification, image348, and manufacturing process attributes 344 may be used to update thetrained model via model training (e.g., model retraining).

In some embodiments, responsive to receiving additional data (e.g.,additional historical images, corresponding manufacturing processattributes, and corresponding image classifications), flow may continueto block 310 to re-train the trained machine learning model based on theadditional data and the original data (e.g., historical images 342,manufacturing process attributes 344, and image classifications 346previously used to train the machine learning model).

In some embodiments, one or more of the acts 310-320 may occur invarious orders and/or with other acts not presented and describedherein. In some embodiments, one or more of acts 310-320 may not beperformed. For example, in some embodiments, one or more of datapartitioning of block 310, model validation of block 314, modelselection of block 316, or model testing of block 318 may not beperformed.

FIG. 4 is a block diagram illustrating a system 400 (e.g., using model190 of FIG. 1) to determine image classification (e.g., imageclassification 146 of FIG. 1), according to certain embodiments. Thesystem 400 may use a trained machine learning model (e.g., model 190 ofFIG. 1) to determine image classification. The image classification isassociated with one or more image processing algorithms that are used toenhance and measure the image for updating manufacturing parameters. Insome embodiments, the model is a CNN model. In some embodiments, themodel is a CNN model trained a priori from scratch. In some embodiments,the model is a CNN model trained using feature identification from apre-trained open source CNN network. The hyperparameters of the modelmay be changed for further optimization (e.g., via retraining).

The system 400 may receive input including an image (e.g., image 148 ofFIG. 1). The input may also include manufacturing process attributes(e.g., manufacturing process attributes 144 of FIG. 1). The system 400may have hidden layers and may perform classification. In the hiddenlayers, the system 400 may perform a first convolution and rectifiedlinear unit (relu) (e.g., including 8 filters, size 3×3, and stride 1),then a second convolution and relu (e.g., 8 filters, size 3×3, stride1), and then determine a maximum pool (e.g., size 3×3). Afterdetermining the max pool, the system 400 may perform flattening, mayperform connecting, and may determine the image classification (e.g.,image classification 146) (e.g., via a softmax function, via a finallayer of a neural network-based classifier, etc.). In some embodiments,the hyperparameters (e.g., filters, size, stride, number ofconvolutions, etc.) of the machine learning model may be changed forfurther optimization.

FIGS. 5-6 are flow diagrams illustrating example methods 500-600associated with determining image classifications (e.g., imageclassification 146 of FIG. 1) of images (e.g., images 148 of FIG. 1),according to certain embodiments. Methods 500-600 may be performed byprocessing logic that may include hardware (e.g., circuitry, dedicatedlogic, programmable logic, microcode, processing device, etc.), software(such as instructions run on a processing device, a general purposecomputer system, or a dedicated machine), firmware, microcode, or acombination thereof. In one embodiment, methods 500-600 may beperformed, in part, by image measurement system 110. In someembodiments, methods 500-600 may be performed by image measurementserver 130. In some embodiments, a non-transitory storage medium storesinstructions that when executed by a processing device (e.g., of imagemeasurement system 110), cause the processing device to perform methods500-600.

For simplicity of explanation, methods 500-600 are depicted anddescribed as a series of acts. However, acts in accordance with thisdisclosure can occur in various orders and/or concurrently and withother acts not presented and described herein. Furthermore, not allillustrated acts may be performed to implement the methods 500-600 inaccordance with the disclosed subject matter. In addition, those skilledin the art will understand and appreciate that the methods 500-600 couldalternatively be represented as a series of interrelated states via astate diagram or events.

FIG. 5 is a flow diagram of a method 500 for determining imagemeasurements (e.g., image measurements 154 of FIG. 1) and automaticallymeasuring images using the determined image measurements. The result ofthe image measurements may be used to determine, for example, criticaldimensions of a semiconductor structure. The result of the imagemeasurements may be used for updating manufacturing parameters (e.g.,manufacturing parameters 156 of FIG. 1), according to certainembodiments. The processing logic (e.g., via method 500) may enablecomplete automation for image measurement so that no user interventionand recipe creation is performed.

Referring to FIG. 5, at block 502 the processing logic receives an image(e.g., image 148 captured by imaging equipment 126 of FIG. 1) of aproduct associated with a manufacturing process (e.g., of manufacturingequipment 124 of FIG. 1). In some embodiments, the processing logicfurther receives manufacturing process attributes (e.g., manufacturingprocess attributes 144 of FIG. 1, tool attributes, project attributes,customer attributes, program attributes, etc.) associated with the image(e.g., attributes of the manufacturing process executed by themanufacturing equipment 124 prior to or while the imaging equipment 126captured the image 148). The manufacturing process attributes may beused for fine tuning the application classification and algorithmidentification. In some embodiments, the images and manufacturingprocess attributes are stored in a data store (e.g., images andmanufacturing process attributes uploaded to a job request imagedatabase as the images are captured by the imaging equipment 126.

In some embodiments, information regarding the image of interest (e.g.,manufacturing process attributes 144 of FIG. 1, job attributes, etc.)and the image (e.g., image 148 of FIG. 1) are stored in a database(e.g., data store 140 of FIG. 1) responsive to the imaging equipment 126(e.g., operated by a SEM technician or process engineer) capturing theimage and the image being uploaded to the server (e.g., uploaded toimage measurement system 110 per user request). The processing logic maysend the image to a pre-trained machine learning model (e.g., CNN) forclassification.

Training of the model may be performed using multiple images from thesame application (e.g., from the same manufacturing process, from thesame manufacturing equipment 124 of FIG. 1, etc.). In the case ofinsufficient training data (e.g., insufficient original images from theapplication), synthetic images may be created with acceptable variationin features expected by changing in process condition. A CNN may be aspecial neural network which can work directly with images. The CNN maybe optimized with hyperparameters (e.g., hyperparameters that providethe greatest accuracy) during the training session. Training of themachine learning model may be done a priori from scratch using multipleimages from the same application or using transfer learning approachfrom pre-trained machine learning models.

In some embodiments, processing logic (e.g., of image measurement system110, of server machine 180, of training engine 182 of FIG. 1) receives atraining dataset (e.g., generated via method 600 of FIG. 6) includinghistorical images 142 that include first images and second images. Eachimage of the first plurality of images may be associated with the imageclassification and may include a first target output of the imageclassification. Each image of the second plurality of images may not beassociated with the image classification and comprises a second targetoutput of a different image classification. The processing logic maytrain the machine learning model (e.g., CNN) to classify images with theimage classification or the different image classification using thetraining dataset to generate the trained machine learning model (e.g.,trained CNN). In some embodiments, the processing logic trains themachine learning model (e.g., CNN) using a transfer learning approachfrom one or more pre-trained networks to generate the trained machinelearning model (e.g., trained CNN).

In some embodiments, processing logic (e.g., of image measurement system110, of server machine 170, of data set generator 172 of FIG. 1)determines that the first images in the training dataset is insufficientto train the machine learning model. The processing logic may createsynthetic images (e.g., synthetic images 142B of FIG. 1) with variationsin features expected by changes in the manufacturing parameters (e.g.,see FIGS. 7-8). The processing logic may add the synthetic images to thefirst images in the training dataset. The synthetic images may be usedto train the machine learning model.

At block 504, the processing logic determines, using a trained machinelearning model (e.g., model 190 of FIG. 1), an image classification(e.g., image classification 146 of FIG. 1) for the image (e.g., theimage is classified by the CNN for feature identification). The imageclassification may identify a type of structure in the image (e.g.,regardless of the type of image modality, regardless of product edgesthat are darker or lighter in the image, etc.). The image classificationmay be determined in order to select the corresponding image processingalgorithm and process information for the image.

In some embodiments, the processing logic extracts from the output ofthe trained machine learning model a confidence level of the imagecorresponding to one or more image classifications. For example, theprocessing logic may extract from the output a 60% confidence of class Aand a 40% confidence of class B. Each image classification maycorrespond to a particular imaged product, image processing algorithm,image enhancement algorithm, and/or image measurement algorithm to usein enhancing and measuring the product represented in the image in someembodiments. In some embodiments, the processing logic determines animage classification responsive to a confidence level above 50% that theimage corresponds to that image classification. Alternatively, adetermination that an image corresponds to a particular imageclassification is responsive to the confidence level being above aconfidence threshold of 60%, 70%, 80% or 90%, for example. In someembodiments, the processing logic determines the trained machinelearning model failed to identify an image classification for an imageresponsive to none of the confidence levels being above 50% (e.g., 30%confidence class A, 30% confidence class B, 40% confidence class C).

In some embodiments, to use the trained machine learning model, theprocessing logic inputs the image and the manufacturing processattributes (e.g., certain attributes from the job request database, suchas project, customer, program, tool names, etc.) into the trainedmachine learning model. The trained machine learning model may outputthe image classification based on the image and the manufacturingprocess attributes.

At block 506, the processing logic selects, based on the imageclassification, one or more image processing algorithms (e.g., one ormore image processing algorithms 149 of FIG. 1, from a pool of imageprocessing algorithms developed for specific applications, from anapplication/algorithm identification look-up table, one or more imageenhancement algorithms and an image measurement algorithm, etc.) andprocess information (e.g., process information 150 of FIG. 1) for theimage. In some embodiments, the one or more image processing algorithmsinclude one or more image enhancement algorithms and an imagemeasurement algorithm. In some embodiments, the image processingalgorithm is a unique algorithm (e.g., unique image measurementalgorithm) that is tailored to measure one or more attributes of theproduct displayed in the image that are produced as a result of themanufacturing process. There may be a unique algorithm for each imageclassification. Image measurement algorithms may include presetparameter values. Alternatively, some image measurement algorithms mayinclude parameter values that are variable (e.g., based on processinformation associated with the image).

In some embodiments, the process information indicates one or more of arange of dimensions of the product in the image, materials of theproduct in the image, edges of the product in the image, shape of thestructure, type of radiation that can penetrate the structure andgenerate an image of the structure, what is expected in the image,expected material contrast, etc. In some embodiments, one or more of theimage processing algorithms or process information indicate how themeasurements are to be performed or how the image is to be enhanced.

In some embodiments, an image processing algorithm may be used for bothpre-processing the image (e.g., block 508) and measuring one or moreattributes of the enhanced image (e.g., block 510). Alternatively, afirst image processing algorithm (e.g., image enhancement algorithm) maybe used to enhance the image and a second image processing algorithm(e.g., an image measurement algorithm) may be used to measure the imageafter it has been enhanced.

At block 508, the processing logic pre-processes the image based on atleast one of the one or more image processing algorithms or the processinformation to generate an enhanced image (e.g., enhanced image 152 ofFIG. 1). In some embodiments, pre-processing the image includesmodifying the image in a manner that enhances edge and feature detectionof the image (e.g., by using one or more image processing algorithms 149and by using advanced image analysis, such as the process information150) to generate the enhanced image.

In some embodiments, to pre-process the image, the processing logic mayone or more of remove noise from the image, change a color gradient inthe image, enhance image contrast of the image, perform a y-directionfilter for measuring between vertical lines in the image, perform anx-direction filter to measure between horizontal lines in the image,smooth the lines in the image, connect edges in the image, etc.

In some embodiments, at least one of the one or more image processingalgorithms or the process information may indicate the structure ormaterial of images in the image classification and dimensions to bemeasured of the images in the image classification. To pre-process theimage, the processing logic may identify structures or materials in theimage and enhance the edges or differences between the structures ormaterials.

In some embodiments, to pre-process the image, the processing logic mayuse one or more pre-processing techniques (e.g., based on the one ormore image processing algorithms or the process information). Thepre-processing techniques may include unidirectional filtering.Responsive to determining one or more of application, customer, orproject to which the image belongs (e.g., based on the manufacturingprocess attributes or process information), the processing logic maydetermine information associated with the structure in the image (e.g.,of a pillar). In some embodiments, based on the determined structure,the processing logic may apply unidirectional filtering to enhancey-direction edge for horizontal critical dimension extraction. In someembodiments, based on the determined structure, the processing logic mayapply unidirectional filtering to enhance x-direction edge for verticalcritical dimension extraction.

In some embodiments, the determined structure may indicate a firstmaterial has substantially a first width (e.g., is about 15 nanometers(nm) wide). To detect the transition between the first material and asecond material, the processing logic may utilize the processinformation and average the gray level (GL) in x-direction of material 1of a first width (e.g., of width 15 nm) to enhance the GL transitionbetween materials. For example, a first image in an image classificationmay have a lighter shade of gray and a second image in the imageclassification may have a darker shade of gray. To performpre-processing, the processing logic may convert the second image to thelighter shade of gray (e.g., responsive to comparing the first andsecond images, based on the gray level of the first image, based on animage processing algorithm). In some embodiments, to performpre-processing, the processing logic may convert one or more portions ofthe image (e.g., convert the edges, target portions of the images, etc.)to a darker gradient (e.g., perform targeted specific dark contrast) tohave more contrast between portions of the product displayed in theimage based on the process information (e.g., instead of a globalstripping or globally increasing of contrast).

In some embodiments, to perform feature identification (e.g., GLinvariant), the structure of a first image may be identified, a matchingtemplate may be stored in the database, and the processing logic mayperform an image GL transformation (e.g., global transformation,targeted transformation, etc.) on the first image based on the matchingtemplate to generate an enhanced image.

In some embodiments, the processing logic may remove edges of residuefrom product edges in an image. By removing the edges of residue, thecontinuity of the product edges may be broken, resulting in two or moreunconnected lines. The processing logic may follow a product edge andconnect the two ends of two or more product edges or lines. This mayprovide continuity for determining correct measurements during imagemeasurement. The processing logic may determine an edge based on processinformation. The processing logic may apply an image processingalgorithm to determine a discontinuity of the edge (e.g., in length),move from a last pixel of the edge to the right until another pixel ofthe edge is found, and join the two pixels by a straight line. In someembodiments, the processing logic may create a box of a certain width atthe last pixel of the edge and move the box to the right (or left, up ordown) until discovering another pixel of the edge and may join the twopixels with a straight line.

At block 510, the processing logic measures, using a first imageprocessing algorithm (e.g., the image processing algorithm used forpre-processing in block 508, an image measurement algorithm, etc.)associated with the image classification, one or more attributes (e.g.,width, height, length, thickness, etc.) of the enhanced image todetermine image measurements (e.g., image measurements 154 of FIG. 1).In some embodiments, the processing logic uses the first imageprocessing algorithm (e.g., image measurement algorithm) to identify afirst edge in the enhanced image and a second edge in the enhanced imageand to determine a distance between the first edge and the second edge.The distance may correspond to the image measurement. In someembodiments, a measurement overlay may be generated, which may be addedto the image. The measured images with measurement overlay may be sentfor report creation.

In some embodiments, the one or more attributes (e.g., width, height,length, thickness, etc.) in the image (e.g., that are to be measured inblock 510) are pre-defined by an image processing algorithm or theprocess information for the image. Based on the image classification(e.g., based on the image and the manufacturing process attributes), oneof the best matched algorithms is chosen from the pool and sent togetherwith the image to block 508.

In some embodiments, the first image processing algorithm (e.g., imagemeasurement algorithm) or the process information indicates to measurefrom left to right, to measure from the top in a downward directionuntil a color changes, to measure at a diagonal, or to make othermeasurements. For example, based on one or more of the first imageprocessing algorithm or the process information, the processing logicmay determine a starting point (e.g., top) of a product, a direction ofmeasurement (e.g., down), and a width (e.g., 15 nm wide) of an area toconsider for the measurement. The processing logic may measure from thestarting point along the entire width in the direction of measurementuntil the stopping point is found (e.g., an average of the pixels alongthe width indicate the stopping point, any one of the pixels along thewidth indicates the stopping point, etc.). By measuring along the entirewidth, the stopping point can be found despite noise, etc. (e.g.,averaging for signal improvement). The stopping point may be determinedby identifying a change in contrast in the image (e.g., indicating anedge).

At block 512, the processing logic reports the image measurements. Thereport may include the images and the corresponding image measurements.The manufacturing parameters (e.g., manufacturing parameters 156 ofFIG. 1) of the manufacturing process (e.g., of manufacturing equipment124 of FIG. 1) may be updated based on the image measurements. In someembodiments, a report is generated and sent (e.g., via email, etc.) tothe user. The measured image (e.g., with overlay) and image measurementsmay be stored in a job request image database (e.g., data store 140).

In some embodiments, at block 514, the processing logic determinesupdates to the manufacturing parameters based on the image measurements.In some embodiments, a device (e.g., client device 120 of FIG. 1, etc.)other than the processing logic determines the updates to themanufacturing parameters based on the image measurements. In someembodiments, user input of updates to the manufacturing parameters basedon the image measurements are received (e.g., by manufacturing equipment124, by client device 120) responsive to reporting the imagemeasurements.

In some embodiments, the processing logic may determine updates tomanufacturing parameters based on one or more of the manufacturingprocess attributes, process information, and the image measurements. Themanufacturing process attributes may indicate manufacturing parametersused when the image was captured. The process information may indicatetarget dimensions (e.g., critical dimensions, specification, etc.). Theprocessing logic may determine that first image measurements of a firstimage corresponding to first manufacturing parameters are closer totarget dimensions than second image dimensions of a second imagecorresponding to second manufacturing parameters. Responsive todetermining the first manufacturing parameters are associated withdimensions that are closer to target dimensions, the processing logicmay determine current manufacturing parameters are to be updated to thefirst manufacturing parameters.

In some embodiments, at block 516, processing logic causes the updatesto the manufacturing parameters to be displayed via a graphical userinterface (e.g., via client device 120, etc.). For example, an alert maybe transmitted to a client device of an administrator of the facilityand displayed via the graphical user interface of the client device.

In some embodiments, at block 518, process logic causes the updates tothe manufacturing parameters to be implemented (e.g., by themanufacturing equipment 124). In some embodiments, the processing logiccauses the manufacturing equipment to shut down based on the imagemeasurements or the updates to the manufacturing parameters (e.g., anupdate of a hardware change).

In some embodiments, the processing logic receives a second image of asecond product associated with the manufacturing process. The processinglogic may determine, using the trained machine learning model, the imageclassification for the second image and may select, based on the imageclassification, one or more image processing algorithms (e.g., one ormore image enhancement algorithms and/or an the image measurementalgorithm) and the process information for the second image. Theprocessing logic may pre-process the second image using at least one ofthe one or more image processing algorithms and/or the processinformation to generate a second enhanced image. In some embodiments,the processing logic may determine a failure in the pre-processing ofthe second image. For example, an image enhancement algorithm mayindicate that a targeted region of the product displayed in the image isto be enhanced. In response to not identifying the targeted region inthe image, the processing logic may determine a failure.

In some embodiments (e.g., responsive to not failing thepre-processing), the processing logic may fail to measure, using theimage processing algorithm, the one or more attributes of the secondenhanced image. For example, the processing logic may determine, basedon one or more of processing information or the image measurementalgorithm), that a dimension is to be within a certain range (e.g.,70-90 nm) and the processing logic may fail to determine a measurementof the dimension for a second image within the range (e.g., determine ameasurement outside of range, such as 200 nm; fail to identify thestopping point of the measurement, e.g., due to lack of contrast or dueto noise; etc.). Upon failing to pre-process (e.g., enhance) an image ordetermine a measurement within the range in the image, the processinglogic may automatically determine a failure (e.g., identify a failure toenhance the image, identify the incorrect or failed measurement, etc.).In some embodiments, the processing logic may automatically determinethe image is an outlier (e.g., processing logic is unable to enhance ormeasure the image despite being able to enhance or measure other imagesthat have the same image classification).

In some embodiments, the processing logic disregards the imagecorresponding to the failure (e.g., failed pre-processing, failedmeasurement). In some embodiments, the processing logic alerts the userthat the image failed pre-processing or measurement. In someembodiments, the processing logic may receive user input to correct theincorrectly enhanced or measured image (e.g., changing contrast of thesecond image, removing noise from the second image). In someembodiments, the processing logic may cause the second image to bemanually enhanced and/or measured to determine a second enhanced imageand/or second image measurements of the one or more attributes and mayreport the second image measurements. In some embodiments, theprocessing logic receives user input to skip the images wherepre-processing or measurement have failed.

FIG. 6 is a flow diagram illustrating an example method of generatingdata sets for determining image classification (e.g., imageclassification 146 of FIG. 1), according to certain embodiments. Imagemeasurement system 110 may use method 600 to at least one of train,validate, or test a machine learning model, in accordance withembodiments of the disclosure. In some embodiments, one or moreoperations of method 600 may be performed by data set generator 172 ofserver machine 170 as described with respect to FIGS. 1 and 2. It may benoted that components described with respect to FIGS. 1 and 2 may beused to illustrate aspects of FIG. 6.

Referring to FIG. 6, in some embodiments, at block 602 the processinglogic implementing method 600 initializes a training set T to an emptyset.

At block 604, processing logic generates first data input (e.g., firsttraining input, first validating input) that includes historical images(e.g., historical images 142 of FIG. 1) and manufacturing processattributes (e.g., manufacturing process attributes 144 of FIG. 1). Insome embodiments, the first data input may include a first set offeatures for manufacturing process attributes and a second data inputmay include a second set of features for the manufacturing processattributes (e.g., as described with respect to FIGS. 2-3).

At block 606, processing logic generates a first target output for oneor more of the data inputs (e.g., first data input). The first targetoutput provides an indication of image classification (e.g., imageclassification 146 of FIG. 1).

At block 608, processing logic optionally generates mapping data that isindicative of an input/output mapping. The input/output mapping (ormapping data) may refer to the data input (e.g., one or more of the datainputs described herein), the target output for the data input (e.g.,where the target output identifies image classification), and anassociation between the data input(s) and the target output.

At block 610, processing logic adds the mapping data generated at block610 to data set T.

At block 612, processing logic branches based on whether data set T issufficient for at least one of training, validating, or testing machinelearning model 190. If so, execution proceeds to block 614, otherwise,execution continues back at block 604. It should be noted that in someembodiments, the sufficiency of data set T may be determined basedsimply on the number of input/output mappings in the data set, while insome other implementations, the sufficiency of data set T may bedetermined based on one or more other criteria (e.g., a measure ofdiversity of the data examples, accuracy, etc.) in addition to, orinstead of, the number of input/output mappings.

At block 614, processing logic provides data set T to train, validate,or test machine learning model 190. In some embodiments, data set T is atraining set and is provided to training engine 182 of server machine180 to perform the training. In some embodiments, data set T is avalidation set and is provided to validation engine 184 of servermachine 180 to perform the validating. In some embodiments, data set Tis a testing set and is provided to testing engine 186 of server machine180 to perform the testing. In some embodiments, input values of a giveninput/output mapping (e.g., numerical values associated with data inputs210) are input to the neural network, and output values (e.g., numericalvalues associated with target outputs 220) of the input/output mappingare stored in the output nodes. The connection weights of the machinelearning model are then adjusted in accordance with a learning algorithm(e.g., back propagation, etc.), and the procedure is repeated for theother input/output mappings in data set T. After block 614, machinelearning model (e.g., machine learning model 190) can be at least one oftrained using training engine 182 of server machine 180, validated usingvalidating engine 184 of server machine 180, or tested using testingengine 186 of server machine 180. The trained machine learning model maybe implemented by image measurement component 132 (of image measurementserver 130) to determine image classifications of images.

To train, validate, or test the machine learning model, each image maybe labeled with the corresponding image classification. In someembodiments, subsequent to the training of the machine learning model,the image processing algorithm and the process information are received(e.g., generated) for each image classification. The image processingalgorithm and the process information may be based on manualmeasurements of the images used for training, validating, or testing themachine learning model.

In some embodiments, upon receiving one or more additional images fromone or more image classifications, the processing logic may retrain(e.g., and revalidate and retest) the trained machine learning model(e.g., based on the additional images and the images previously used totrain the machine learning model. By retraining the trained machinelearning model, the hyperparameters (e.g., layers in neural network,etc.) may be updated to use the hyperparameters that provide thegreatest accuracy (e.g., responsive to accuracy dropping from 90%initial accuracy to 80% current accuracy using a first hyperparameter, asecond hyperparameter that provides 85% current accuracy may be used).

FIG. 7 is a block diagram illustrating a system 700 (e.g., imagemeasurement system 110, server machine 170, data set generator 172 ofFIG. 1) of generating synthetic images (e.g., synthetic images 142B ofFIG. 1), according to certain embodiments.

In some embodiments, the system 700 may receive original images 742A(e.g., original images 142A of FIG. 1) and may determine that theoriginal images 742A are insufficient to train a machine learning model.The system 700 may provide the original images 742A to a synthetic imagegenerator 710 (e.g., server machine 170, data set generator 172 ofFIG. 1) of the system 700.

The synthetic image generator 710 may be an iterative algorithm thatchanges the position (e.g., in direction and magnitude) of individualvalues at corresponding locations (e.g., pixels) in the original image742A to updated corresponding locations (e.g., updated pixels) based ona randomly initialized deformation field 720. Each value correspondingto a pixel may move in eight directions (e.g., up, up-right, right,right-down, down, down-left, left, left-up) independently and stillfollow the global similarity criteria with the original image 742A.After each iteration, the deformation field 720 may be updated. Thenumber of iterations and a sum of squared error (SSE) (e.g., global SSE)can be used as stopping criteria 730 for the algorithm. The sum ofsquared error (SSE) may be calculated by the following equation:SSE=Σ_(i=1) ^(k)Σ_(x∈Ci) d(x,m _(i))²

where k is the number of clusters, C_(i) is the i-th cluster, x is adata point in cluster C_(i) and m_(i) is the representative point (e.g.,centroid, mean vector of all data points in C_(i)) for cluster C_(i),and d(x, m_(i)) is a distance (Euclidian distance) between data point xand representative point m_(i).

FIG. 7 illustrates a deformation field 720 and a zoomed view of aportion of the deformation field 720. The deformation field 720 mayindicate a direction and magnitude of targeted deformation for one ormore pixels of the image (e.g., targeted deformation may move locationof one edge in a target direction or any direction without moving otherportions of an image). The deformation field 720 may have an equal orweighted probability of different directions.

The deformation field 720 may have vectors associated with each pixelthat indicate a difference between the images that are compared (e.g.,difference between the initial synthetic image and original image). Thelength of each vector may represent a magnitude of displacement betweenthe original image and the current iteration of the synthetic image. Thedeformation field 720 (e.g., displacement field) may be a vector fieldof all displacement vectors for all particles in a body (e.g., continuumbody, product displayed in an original image), which relates thedeformed configuration (e.g., synthetic image) with the undeformedconfiguration (e.g., original image). The analysis of deformation of thebody may be in terms of the deformation field. In general, thedeformation field may be expressed in terms of the material coordinatesas:u(X,t)=b(X,t)+x(X,t)−X, or u _(i)=α_(iJ) b _(J) +x _(i)−α_(iJ) X _(J)

or in terms of the spatial coordinates as:U(x,t)=b(x,t)+x−X(x,t), or U _(J) =b _(J)+α_(Ji) x _(i) −X _(J)

where α_(Ji) are the direction cosines between the material and spatialcoordinate systems with unit vectors E_(J) and e_(i), respectively.Thus,E _(J) ·e _(i)=α_(Ji)=α_(iJ)

and the relationship between u_(i) and U_(J) is then given byu _(i)=α_(iJ) U _(J) or U _(J)=α_(Ji) u _(i)

Knowing thate _(i)=α_(iJ) E _(J),thenu(X,t)=u _(i) e _(i) =u _(i)(α_(iJ) E _(J))=U _(J) E _(J) =U(x,t)

The coordinate systems for the undeformed and deformed configurationsmay be superimposed, which results in b=0, and the direction cosines maybecome Kronecker deltas:E _(J) ·e _(i)=δ_(Ji)=δ_(iJ)

Thus, we have:u(X,t)=x(X,t)−X, or u _(i) =x _(i)−δ_(iJ) X _(J) =x _(i) −X _(i)

or in terms of the spatial coordinates as:U(x,t)=x−X(x,t) or U _(J)=δ_(Ji) x _(i) −X _(J) =x _(J) −X _(J)

The deformation field 720 may be used to further adjust the syntheticimage. Points on one or more edges of the synthetic image may be movedin a direction according to the deformation field 720, for example. Azoomed in portion of the deformation field 720 may indicate some valuesin the image corresponding to particular pixels are to move in a firstdirection, others in a second direction, etc. Values of pixelscorresponding to the shape of the edges of the features that are to bedeformed may have an associated magnitude of deformation based on thedifference between the compared images (e.g., larger magnitude forlarger difference, smaller magnitude based on smaller difference, nodeformation based on no difference, etc.).

In some embodiments, the deformation field 720 is a probability of pixelvalue changing. The deformation field 720 may be weighted based ondifferences between images and process information (e.g., themanufacturing process may produce products with differences in certaindimensions).

The synthetic image generator 710 may generate one or more syntheticimages 742B (e.g., synthetic images 142B of FIG. 1) for each originalimage 742A. The original images 742A and synthetic images 742B incombination may be sufficient to train the machine learning model.

To generate a synthetic image 742B, the synthetic image generator 710may perform feature extraction to identify features of a first originalimage 742A that are expected to change based on manufacturing parametersof the manufacturing process. To generate the synthetic image 742B, thesynthetic image generator 710 may further perform targeted deformationof one or more features of the first original image 742A.

In some embodiments, the synthetic image generator 710 may determinestopping criteria 730 for the targeted deformation based on a criticaldimension of the product. The synthetic image generator 710 may performthe targeted deformation by iteratively moving one or more points on afeature until a threshold number of iterations have completed or thestopping criteria 730 is reached. The targeted deformation may be in adesignated direction of movement.

In some embodiments, the first synthetic image 742B is further generatedbased on a targeted deformation field 720 that is randomly initialized.The synthetic image generator 710 may compare the synthetic image 742Bto a original image of the original images to determine differences. Thesynthetic image generator 710 may update the deformation field 720 basedon the differences to generate an updated deformation field 720. Thesynthetic image generator 710 may generate a second synthetic image byadjusting the first original image based on the updated deformationfield 720. The deformation field 720 may include pixel value adjustmentsthat have a weighted probability based on process information (e.g.,process information 150 of FIG. 1).

In some embodiments, the first synthetic image 742B is generated byperforming a combination of targeted deformation and global deformationof the first original image 742A. The global deformation may include oneor more of flipping, shifting, rotating, zooming in, zooming out, etc.the first original image 742A. The global deformation may be performedbefore or after performing the targeted deformation.

FIG. 8 is a flow diagram illustrating an example method 800 ofgenerating synthetic images (e.g., synthetic images 142B of FIG. 1),according to certain embodiments. Method 800 may be performed byprocessing logic that may include hardware (e.g., circuitry, dedicatedlogic, programmable logic, microcode, processing device, etc.), software(such as instructions run on a processing device, a general purposecomputer system, or a dedicated machine), firmware, microcode, or acombination thereof. In one embodiment, method 800 may be performed, inpart, by image measurement system 110. In some embodiments, method 800may be performed by image measurement server 130. In some embodiments, anon-transitory storage medium stores instructions that when executed bya processing device (e.g., of image measurement system 110) cause theprocessing device to perform method 800.

For simplicity of explanation, method 800 is depicted and described as aseries of acts. However, acts in accordance with this disclosure canoccur in various orders and/or concurrently and with other acts notpresented and described herein. Furthermore, not all illustrated actsmay be performed to implement the method 800 in accordance with thedisclosed subject matter. In addition, those skilled in the art willunderstand and appreciate that the method 800 could alternatively berepresented as a series of interrelated states via a state diagram orevents.

Referring to FIG. 8, at block 802 the processing logic receives originalimages (e.g., original images 142A of FIG. 1) including a first originalimage. Each original image of the plurality of original images is of acorresponding product associated with a manufacturing process (e.g.,performed by manufacturing equipment 124 of FIG. 1). In someembodiments, to train a machine learning model, a threshold amount ofimages from each image classification are to be used (e.g., 150 imagesfrom each image classification, 1000 images from each imageclassification, 10,000 images for each image classification, etc.). Insome embodiments, the threshold amount of images is based on enoughimages to determine a delta or range of one or more dimensions to bemeasured using one or more of an image processing algorithm (e.g., animage measurement algorithm) or process information (e.g., a range of50-60 nm is determined using at least 150 images). In some embodiments,the processing logic determines that the amount of original images(e.g., less than 150 images) is insufficient to train the machinelearning model. The operations of blocks 804-808 may be performedresponsive to determining that the amount of original images isinsufficient to train the machine learning model.

At block 804, the processing logic performs, based on processinformation (e.g., processing information 150 of FIG. 1) about themanufacturing process, feature extraction on the first original image toidentify features of the first original image that are expected tochange based on changes to manufacturing parameters (e.g., manufacturingparameters 156) of the manufacturing process. The process informationmay indicate structure of the product in the images, range ofdimensions, whether certain dimensions may shrink or increase from imageto image (e.g., based process parameters), which dimensions areimportant, etc. The processing logic may determine edges of the productin the image that are to come closer together and are to move furtherapart based on the manufacturing parameters (e.g., are to have adimension that is within a range).

At block 806, the processing logic generates a first synthetic image ofsynthetic images (e.g., synthetic images 142B of FIG. 1) by performingtargeted deformation of one or more of the features of the firstoriginal image. The targeted deformation adjusts one or more of thefeatures. The processing logic may move every point along an identifiededge to generate one or more synthetic images (e.g., move every pointalong an identified edge one pixel to the left for a first syntheticimage, move every point along the identified edge another pixel to theleft for a second synthetic image, etc.).

In some embodiments, the processing logic generates one or moresynthetic images (e.g., by moving edges of the original image)responsive to determining an image classification for the originalimage, determining one or more of an image processing algorithm (e.g.,an image measurement algorithm) or process information based on theimage classification, and determining the edges (e.g., that areassociated with critical dimensions, that are to move based on themanufacturing parameters, etc.).

In some embodiments, the processing logic generates an initial syntheticimage based on random deformation of the edges (e.g., based on a firstoriginal image and a random deformation field) and then generatessubsequent synthetic images based on targeted deformation. Theprocessing logic may determine locations corresponding to differencesbetween the initial synthetic image and a second original image andperform targeted deformation at those locations (e.g., without deformingother portions of the image).

In some embodiments, the processing logic determines stopping criteria(e.g., stopping criteria 730 of FIG. 7) for the targeted deformationbased on a critical dimension of the product. The processing logic mayperform the targeted deformation by iteratively moving one or morepoints on a feature (e.g., moving one or more points one pixel to theleft in the first iteration, moving the one or more points another pixelto the left in the second iteration, etc.) until a threshold number ofiterations have completed or the stopping criteria is reached. Thetargeted deformation may be in a designated direction of movement. Thestopping criteria may be used so that the synthetic images would be inthe same image classification as the original images (e.g., thesynthetic images would not be so distorted that they are no longerrecognized as the same image classification as the original images). Theprocessing logic may determine the stopping criteria based on theprocess information (e.g., process information indicates a range of400-500 nm and the stopping criteria would allow iterations as long asthe dimension is still between 400 and 500 nm (e.g., allow to shrinkuntil 400 nm and allow to increase until 500 nm)).

In some embodiments, the first synthetic image is further generatedbased on a deformation field (e.g., deformation field 720 of FIG. 7)that may be randomly initialized. If the deformation field is randomlyinitialized, then the initial displacement of each point on the edgesmay be in a random direction. The processing logic may then compare thesynthetic image to an original image of the original images to determinedifferences therebetween after the initial displacement. The processinglogic may update the deformation field based on the differences togenerate an updated deformation field. The processing logic may generatea second synthetic image by adjusting the first original image based onthe updated deformation field. In some embodiments, the deformationfield includes pixel value adjustments that have a weighted probabilitybased on process information.

In some embodiments, the first synthetic image is further generated byperforming a global deformation of the first original image. In someembodiments, the global deformation includes one or more of flipping,shifting, rotating, zooming in, zooming out, etc. the first originalimage. In some embodiments, a first set of synthetic images aregenerated by performing targeted deformations to original images. Insome embodiments, a second set of synthetic images are generated byperforming global deformations to original images. In some embodiments,a third set of synthetic images are generated by performing bothtargeted and global deformations to the original images.

At block 808, the processing logic uses the original images and thesynthetic images to train a machine learning model (e.g., model 190 ofFIG. 1) to automatically determine one or more image processingalgorithms (e.g., one or more image processing algorithms 149 of FIG. 1)to use for measuring one or more attributes of images (e.g., images 148)of product associated with the manufacturing process. The originalimages and the synthetic images in combination may be sufficient totrain the machine learning model.

In some embodiments, at block 810, the processing logic determinesupdates to the manufacturing parameters based on the measured one ormore attributes (e.g., image measurements 154 of FIG. 1). Block 810 maybe similar to block 514 of FIG. 5.

In some embodiments, at block 812, processing logic causes the updatesto the manufacturing parameters to be displayed via a graphical userinterface (e.g., via client device 120, etc.). For example, an alert maybe transmitted to a client device of an administrator of the facility.

In some embodiments, at block 814, process logic causes the updates tothe manufacturing parameters to be implemented (e.g., by themanufacturing equipment 124). In some embodiments, the processing logiccauses the manufacturing equipment to shut down based on the imagemeasurements or the updates to the manufacturing parameters (e.g.,update of a hardware change, update of a process change, etc.).

FIG. 9 is a block diagram illustrating a computer system 900, accordingto certain embodiments. In some embodiments, computer system 900 may beconnected (e.g., via a network, such as a Local Area Network (LAN), anintranet, an extranet, or the Internet) to other computer systems.Computer system 900 may operate in the capacity of a server or a clientcomputer in a client-server environment, or as a peer computer in apeer-to-peer or distributed network environment. Computer system 900 maybe provided by a personal computer (PC), a tablet PC, a set-top box(STB), a Personal Digital Assistant (PDA), a cellular telephone, a webappliance, a server, a network router, switch or bridge, or any devicecapable of executing a set of instructions (sequential or otherwise)that specify actions to be taken by that device. Further, the term“computer” shall include any collection of computers that individuallyor jointly execute a set (or multiple sets) of instructions to performany one or more of the methods described herein.

In a further aspect, the computer system 900 may include a processingdevice 902, a volatile memory 904 (e.g., random access memory (RAM)), anon-volatile memory 906 (e.g., read-only memory (ROM) orelectrically-erasable programmable ROM (EEPROM)), and a data storagedevice 916, which may communicate with each other via a bus 908.

Processing device 902 may be provided by one or more processors such asa general purpose processor (such as, for example, a complex instructionset computing (CISC) microprocessor, a reduced instruction set computing(RISC) microprocessor, a very long instruction word (VLIW)microprocessor, a microprocessor implementing other types of instructionsets, or a microprocessor implementing a combination of types ofinstruction sets) or a specialized processor (such as, for example, anapplication specific integrated circuit (ASIC), a field programmablegate array (FPGA), a digital signal processor (DSP), or a networkprocessor).

Computer system 900 may further include a network interface device 922.Computer system 900 also may include a video display unit 910 (e.g., anLCD), an alphanumeric input device 912 (e.g., a keyboard), a cursorcontrol device 914 (e.g., a mouse), and a signal generation device 920.

In some implementations, data storage device 916 may include anon-transitory computer-readable storage medium 924 on which may storeinstructions 926 encoding any one or more of the methods or functionsdescribed herein, including instructions encoding the image measurementcomponent 132 (e.g., for determining an image measurement, forgenerating synthetic images, etc.) or manufacturing parametermodification component 122 of FIG. 1 and for implementing methodsdescribed herein.

Instructions 926 may also reside, completely or partially, withinvolatile memory 904 and/or within processing device 902 during executionthereof by computer system 900, hence, volatile memory 904 andprocessing device 902 may also constitute machine-readable storagemedia.

While computer-readable storage medium 924 is shown in the illustrativeexamples as a single medium, the term “computer-readable storage medium”shall include a single medium or multiple media (e.g., a centralized ordistributed database, and/or associated caches and servers) that storethe one or more sets of executable instructions. The term“computer-readable storage medium” shall also include any tangiblemedium that is capable of storing or encoding a set of instructions forexecution by a computer that cause the computer to perform any one ormore of the methods described herein. The term “computer-readablestorage medium” shall include, but not be limited to, solid-statememories, optical media, and magnetic media.

The methods, components, and features described herein may beimplemented by discrete hardware components or may be integrated in thefunctionality of other hardware components such as ASICS, FPGAs, DSPs orsimilar devices. In addition, the methods, components, and features maybe implemented by firmware modules or functional circuitry withinhardware devices. Further, the methods, components, and features may beimplemented in any combination of hardware devices and computer programcomponents, or in computer programs.

Unless specifically stated otherwise, terms such as “receiving,”“determining,” “selecting,” “pre-processing,” “measuring,” “reporting,”“updating,” “inputting,” “training,” “creating,” “adding,” “failing,”“causing,” “performing,” “generating,” “using,” “comparing,” “flipping,”“shifting,” “rotating,” “zooming,” or the like, refer to actions andprocesses performed or implemented by computer systems that manipulatesand transforms data represented as physical (electronic) quantitieswithin the computer system registers and memories into other datasimilarly represented as physical quantities within the computer systemmemories or registers or other such information storage, transmission ordisplay devices. Also, the terms “first,” “second,” “third,” “fourth,”etc. as used herein are meant as labels to distinguish among differentelements and may not have an ordinal meaning according to theirnumerical designation.

Examples described herein also relate to an apparatus for performing themethods described herein. This apparatus may be specially constructedfor performing the methods described herein, or it may include a generalpurpose computer system selectively programmed by a computer programstored in the computer system. Such a computer program may be stored ina computer-readable tangible storage medium.

The methods and illustrative examples described herein are notinherently related to any particular computer or other apparatus.Various general purpose systems may be used in accordance with theteachings described herein, or it may prove convenient to construct morespecialized apparatus to perform methods described herein and/or each oftheir individual functions, routines, subroutines, or operations.Examples of the structure for a variety of these systems are set forthin the description above.

The above description is intended to be illustrative, and notrestrictive. Although the present disclosure has been described withreferences to specific illustrative examples and implementations, itwill be recognized that the present disclosure is not limited to theexamples and implementations described. The scope of the disclosureshould be determined with reference to the following claims, along withthe full scope of equivalents to which the claims are entitled.

What is claimed is:
 1. A method comprising: providing attributes of amanufacturing process and an image of a product associated with themanufacturing process to a trained machine learning model; obtaining,from the trained machine learning model, predictive data; anddetermining, based on the predictive data, image measurements of theimage of the product associated with the manufacturing process, whereinmanufacturing parameters of the manufacturing process are to be updatedbased on the image measurements.
 2. The method of claim 1 furthercomprising: determining that the image is associated with themanufacturing parameters of the manufacturing process; determininghistorical image measurements of historical images associated withhistorical manufacturing parameters are closer to target dimensions thanthe image measurements; and determining updates to the manufacturingparameters based on the historical manufacturing parameters.
 3. Themethod of claim 2 further comprising causing the updates to themanufacturing parameters to be displayed via a graphical user interface.4. The method of claim 2 further comprising causing the updates to themanufacturing parameters to be implemented by manufacturing equipment.5. The method of claim 2 further comprising causing operation ofmanufacturing equipment to be interrupted to implement the updates tothe manufacturing parameters.
 6. The method of claim 1, wherein themanufacturing parameters comprise a process parameter.
 7. The method ofclaim 1, wherein the manufacturing parameters comprise a hardwareparameter.
 8. A system comprising: a memory; and a processing device,coupled to the memory, to: provide attributes of a manufacturing processand an image of a product associated with the manufacturing process to atrained machine learning model; obtain, from the trained machinelearning model, predictive data; and determine, based on the predictivedata, image measurements of the image of the product associated with themanufacturing process, wherein manufacturing parameters of themanufacturing process are to be updated based on the image measurements.9. The system of claim 8, wherein the processing device is further to:determine that the image is associated with the manufacturing parametersof the manufacturing process; determine historical image measurements ofhistorical images associated with historical manufacturing parametersare closer to target dimensions than the image measurements; anddetermine updates to the manufacturing parameters based on thehistorical manufacturing parameters.
 10. The system of claim 9, whereinthe processing device is further to cause the updates to themanufacturing parameters to be displayed via a graphical user interface.11. The system of claim 9, wherein the processing device is further tocause the updates to the manufacturing parameters to be implemented bymanufacturing equipment.
 12. The system of claim 9, wherein theprocessing device is further to cause operation of manufacturingequipment to be interrupted to implement the updates to themanufacturing parameters.
 13. The system of claim 8, wherein themanufacturing parameters comprise a process parameter.
 14. The system ofclaim 8, wherein the manufacturing parameters comprise a hardwareparameter.
 15. A non-transitory computer readable medium havinginstructions stored thereon, which, when executed by a processingdevice, cause the processing device to perform operations comprising:providing attributes of a manufacturing process and an image of aproduct associated with the manufacturing process to a trained machinelearning model; obtaining, from the trained machine learning model,predictive data; and determining, based on the predictive data, imagemeasurements of the image of the product associated with themanufacturing process, wherein manufacturing parameters of themanufacturing process are to be updated based on the image measurements.16. The non-transitory computer readable medium of claim 15, wherein theoperations further comprise: determining that the image is associatedwith the manufacturing parameters of the manufacturing process;determining historical image measurements of historical imagesassociated with historical manufacturing parameters are closer to targetdimensions than the image measurements; and determining updates to themanufacturing parameters based on the historical manufacturingparameters.
 17. The non-transitory computer readable medium of claim 16,wherein the operations further comprise causing the updates to themanufacturing parameters to be displayed via a graphical user interface.18. The non-transitory computer readable medium of claim 16, wherein theoperations further comprise causing the updates to the manufacturingparameters to be implemented by manufacturing equipment.
 19. Thenon-transitory computer readable medium of claim 16, wherein theoperations further comprise causing operation of manufacturing equipmentto be interrupted to implement the updates to the manufacturingparameters.
 20. The non-transitory computer readable medium of claim 15,wherein the manufacturing parameters comprise one or more of a processparameter or a hardware parameter.